R&D

TCE is passionate about working with foundry, IDM, and design house customers in the development of photomask solutions that address today and tomorrow's semiconductor manufacturing challenges. TCE is a leader in RET(Resolution Enhancement Technology) development, working with cutting-edge photomask technologies that span Conventional Binary Mask, Attenuated Embedded PSM, Tri-tone PSM, Alternating type PSM, CPL (Chromeless Phase-shift Lithography) and High Transmittance PSM.