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Presentation & Papers


2007  
2007/PMJ The Effect between Absorber Profile and Wafer Print Process Window in ArF 6% Att. PSM Mask
2007/PMJ Influence of Environmental Components on Haze Growth
2007/PMJ Application of exposure simulation system to CD control investigation at 130-nm photolithography node


2006  
2006/PMJ Advanced hybrid-mask process development
2006/PMJ Hybrid mask (CPL-attPSM) technology for DRAM
2006/BACUS Non-chemical cleaning technology for sub-90nm design node photomask manufacturing
2006/BACUS The Effect between Mask Blank Flatness and Wafer Print Process Window in ArF 6% Att. PSM Mask
2006/BACUS Study of Chrome-less Mask Quartz Defect Detection Capability for 80nm Post Structure
2006/BACUS Incoming Database Verification and Management for Mask Data Preparation


2005  
2005/PMJ New slit scan developer system for advanced 45nm node mask making
2005/PMJ Effects of Mask Bias on the Mask Error Enhancement Factor (MEEF) for Low k1 Lithography
2005/PMJ Application of CPL Mask for whole Chip 65nm DRAM Patterning
2005/BACUS Real-World Impact of Inverse Lithography Technology
2005/BACUS CAR evaluation For 65nm


2004  
2004/PMJ Evaluation, Reduction and Monitoring of Progressive Defect on 193nm Reticles for Low-k1 Process
2004/SPIE Correlating reticle pinhole defects to wafer printability for the 90nm node lithography using advanced RET
2004/BACUS Reduce Process Bias of Photomask Manufacturing for Next Generation Lithography
2004/Photonics Asia Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPLTM technology


2003  
2003/PMJ Practical approach for AAPSM image imbalance correlation for Sub-100nm lithography
2003/PMJ Investigation of phase variation impact on CPL PSM for Low k1 imaging
2003/BACUS 90nm production by using AAPSM with practical image imbalance correction
2003/BACUS Effect of dry etching pattern profile on the chromeless phase lithography (CPL) mask
2003/BACUS Low k1 lithography patterning options for 90nm node


2002  
2002/PMJ The Comparison and Correlation of VSS Simulation Results Using Image from Different Inspection Tools
2002/PMJ The Process of Manufacturing & Inspection of High-end (Ternary) Tritone EAPSMs Reticles for 0.13um Design Rule generation
2002/PMJ The Comparison Between Positive and Negative 50Kev E-beam CAR for 0.10um Generation

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