Photomasks|On-chip Color Filter
Photomasks
Year/Month | Milestones |
2015.May |
25 nm DRAM Mask Production |
2013.Oct |
28 nm Logic Mask production |
2012.Jul |
3x nm DRAM Mask production |
2011.Mar |
4x nm DRAM Mask Production |
2010.Oct |
40 nm Logic Mask Production |
2010.May |
5Xnm DRAM Mask production |
2009.Dec |
6x nm DRAM Mask Production |
2008.Jun |
TS 16949 Compliance Certification |
2008.Apr |
ISO 27001 Certification |
2007.Dec |
70nm DRAM Mask Production |
2007.Mar |
ArF PSM Mask Fully non-sulfate cleaning release |
2006.Oct |
65nm Logic Mask Production |
2004.Dec |
QS 9000 Certification |
2004.Feb |
90nm Logic Mask Production |
2003.Oct |
ISO 14000 and OHSAS 18000 Certification |
2002.Dec |
110nm DRAM Mask Production + ArF Half Tone Mask Production |
2001.Oct |
130nm Logic Mask Production |
2000.Apr |
ISO 9000 Certification |
1999.Sep |
180nm Mask Production |
1998.Apr |
Commencement of commercial production in Taiwan |
1997.May |
New Company Established |
On-chip Color Filter
Year/Month | Milestones |
2016.Aug |
Phase-3 mass production |
2015.Jul |
Phase-2 mass production |
2014.Mar |
1.1 um BSI production |
2013.Aug |
1.1 um production |
2013.Jul |
1.75 um and 1.4 um production |
2013.Jun |
ISO 9000 and 14001 Certification |
2013.Feb |
Company Established |