About-TCE

Photomasks

Year/Month	Milestones
2015.May	25 nm DRAM Mask Production
2013.Oct	28 nm Logic Mask production
2012.Jul	3x nm DRAM Mask production
2011.Mar	4x nm DRAM Mask Production
2010.Oct	40 nm Logic Mask Production
2010.May	5Xnm DRAM Mask production
2009.Dec	6x nm DRAM Mask Production
2008.Jun	TS 16949 Compliance Certification
2008.Apr	ISO 27001 Certification
2007.Dec	70nm DRAM Mask Production
2007.Mar	ArF PSM Mask Fully non-sulfate cleaning release
2006.Oct	65nm Logic Mask Production
2004.Dec	QS 9000 Certification
2004.Feb	90nm Logic Mask Production
2003.Oct	ISO 14000 and OHSAS 18000 Certification
2002.Dec	110nm DRAM Mask Production + ArF Half Tone Mask Production
2001.Oct	130nm Logic Mask Production
2000.Apr	ISO 9000 Certification
1999.Sep	180nm Mask Production
1998.Apr	Commencement of commercial production in Taiwan
1997.May	New Company Established

On-chip Color Filter