PhotomasksOn-chip Color Filter


2015.May 25 nm DRAM Mask Production
2013.Oct 28 nm Logic Mask production
2012.Jul 3x nm DRAM Mask production
2011.Mar 4x nm DRAM Mask Production
2010.Oct 40 nm Logic Mask Production
2010.May 5Xnm DRAM Mask production
2009.Dec 6x nm DRAM Mask Production
2008.Jun TS 16949 Compliance Certification
2008.Apr ISO 27001 Certification
2007.Dec 70nm DRAM Mask Production
2007.Mar ArF PSM Mask Fully non-sulfate cleaning release
2006.Oct 65nm Logic Mask Production
2004.Dec QS 9000 Certification
2004.Feb 90nm Logic Mask Production
2003.Oct ISO 14000 and OHSAS 18000 Certification
2002.Dec 110nm DRAM Mask Production + ArF Half Tone Mask Production
2001.Oct 130nm Logic Mask Production
2000.Apr ISO 9000 Certification
1999.Sep 180nm Mask Production
1998.Apr Commencement of commercial production in Taiwan
1997.May New Company Established

On-chip Color Filter

2016.Aug Phase-3 mass production
2015.Jul Phase-2 mass production
2014.Mar 1.1 um BSI production
2013.Aug 1.1 um production
2013.Jul 1.75 um and 1.4 um production
2013.Jun ISO 9000 and 14001 Certification
2013.Feb Company Established