光罩在半導體製造技術的演進已成為不可或缺的關鍵角色。作為全球領先的光罩供應商 - 中華凸版透過固定舉辦『凸版技術研討會』,提供既有合作往來客戶及潛在客戶發表半導體產業發展趨勢及最新光罩技術服務演進。這個技術論壇的目的在於提供開放式交流平台,直接讓業界菁英們與光罩技術專業人員溝通互動。在選擇光罩合作開發及技術解決方案上,儼然已成為國內外半導體交流互動之絕佳盛會。 As one of Taiwan's leading photomask providers, TCE hosts the “FutureMask” forum regularly in order to inform existing and potential clients of the company’s latest technological advances and introduce upcoming products and services. The purpose of this technology forum is to communicate directly with leading technology professionals— whom are the key decisions makers when selecting vendor-partners and their technology solutions. |
會場資訊 | |||||||
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November 22nd, 2019 in Hsinchu, Taiwan
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Topics | |
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For additional questions, please contact | ||||||
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Amy Lee 李小姐 / John Huang 黃先生
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Invitation |
Access the Latest Photomask Technologies |
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時間 Time(Duration) |
主題 Topic |
主講者 Speaker |
備註 備註 |
主講者 Speaker |
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09:00 - 09:05 |
Stream Video |
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09:05 - 09:10 |
Opening Address |
Mr.Tadashi Ishimatsu President,Toppan Chunghwa Electronics Co., Ltd. |
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09:10 - 09:25 |
Introduction to Toppan Technology Forum 2019 |
Mr. Tetsuro Ueki Director & Senior Managing Executive Officer,Electronics Division and Ortus Subdivision, Toppan Printing Co., Ltd. |
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09:25 - 09:40 |
Strategy of Toppan Photomask |
Mr. Michael Hadsell President,Toppan Photomasks, Inc. |
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09:40-10:10 |
< Morning Keynote > Beyond the Moore's lawDisruptive and Revolutionary Era of Quantum Computer |
Dr. Chingray Chang Professor of Physics,National Taiwan University (Former Interim President , NTU) |
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10:10 - 10:35 |
Tea Break (25 min) |
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10:35 - 11:00 |
Introduction of Development and Design of Sensor ICs |
Mr. Yasuyuki Imai Manager of Device OEM Production Planning,Toppan Technical Design Center Co., Ltd. |
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11:00 - 11:30 |
< Morning Keynote 2 > Paradigm Shift in DRAM Industry |
Dr. Pei-Lin Pai Vice President, Research and Development,Winbond Electronics Corporation |
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11:30 - 13:00 |
Lunch Break (90 min) |
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13:00 - 13:05 |
Stream Video |
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13:05 - 13:45 |
<Afternoon Keynote> From the 1000x Challenge to 5G and AIoT |
Dr. Yang Du Vice President, Research and Development,Vanguard International Semiconductor Co. |
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13:45 - 14:25 |
Which Type of Photomask Is the Best from the Viewpoint of the Wafer Lithography? |
Mr. Yusuke Okawa Deputy Manager of PM Development,Toppan Printing Co, Ltd. |
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14:25-14:45 |
Next-gen EUV Mask Materials |
Dr. Franklin Kalk Executive Vice President of Technology,Toppan Photomasks, Inc. |
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14:45 - 15:15 |
Tea Break (30 min) |
Q&A Session at Lobby |
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15:15 - 15:45 |
Single Beam/Multi Beam Writer Opportunities and TCE Advanced Mask Technology for 7 nm and Beyond |
Mr. Masayuki Kagawa SupervisorPhotomask Technology Strategy and Integration, Toppan Printing Co, Ltd |
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Mr. Anton Chang Vice President, Photomask Operations,Toppan Chunghwa Electronics Co., Ltd. |
15:45 |
Wrap Up |
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