新聞與活動
研討會
光罩在半導體製造技術的演進已成為不可或缺的關鍵角色。作為全球領先的光罩供應商 - 中華凸版透過固定舉辦『凸版技術研討會』，提供既有合作往來客戶及潛在客戶發表半導體產業發展趨勢及最新光罩技術服務演進。這個技術論壇的目的在於提供開放式交流平台，直接讓業界菁英們與光罩技術專業人員溝通互動。在選擇光罩合作開發及技術解決方案上，儼然已成為國內外半導體交流互動之絕佳盛會。

As one of Taiwan's leading photomask providers, TCE hosts the “FutureMask” forum regularly in order to inform existing and potential clients of the company’s latest technological advances and introduce upcoming products and services. The purpose of this technology forum is to communicate directly with leading technology professionals— whom are the key decisions makers when selecting vendor-partners and their technology solutions.
會場資訊

November 22nd, 2019 in Hsinchu, Taiwan

TIME

 09:00 am~15:45 pm

VENUE

 Ambassador Hsinchu /
10F,188 Chung Hwa Rd.,
Sec.2, Hsinchu, Taiwan
新竹國賓大飯店
新竹市中華路二段188號10F

TEL

 +886-3-515-1111
Topics
  • VIP Speaker Speech
    • Beyond the Moore's law Disruptive and Revolutionary Era of Quantum Computer
    • Paradigm Shift in DRAM Industry
    • From the 1000x Challenge to 5G and AIoT
  • Introduction to Toppan Technology Forum 2019 
  • Strategy of Toppan Photomask
  • Introduction of development and design of sensor Ics
  • Which Type of Photomask Is the Best from the View Point of the Wafer Lithography?
  • Next-gen EUV Mask Materials
  • Single Beam/Multi Beam Writer Opportunities and TCE Advanced Mask Technology for 7 nm and Beyond
For additional questions, please contact
 Amy Lee 李小姐 / John Huang 黃先生
電話 +886-3-364-3300 ext.20505 / 20514
傳真 +886-3-3-364-9922
信箱

amy_lee@tce.com.tw / john_huang.c.y@tce.com.tw 
Invitation

Access the Latest Photomask Technologies
at Toppan Technology Forum 2019

https://www.digitimes.com.tw/seminar/TCE_20191122/
歷年TTF照片
Toppan Technology Forum 2019 Agenda
時間
Time(Duration) 		主題
Topic 		主講者
Speaker 		備註
備註 		主講者
Speaker

09:00 - 09:05

Stream Video

-

09:05 - 09:10

Opening Address

Mr.Tadashi Ishimatsu

President,
Toppan Chunghwa Electronics Co., Ltd.

09:10 - 09:25

Introduction to Toppan
Technology Forum 2019

Mr. Tetsuro Ueki

Director & Senior Managing Executive Officer,
Electronics Division and Ortus Subdivision,
Toppan Printing Co., Ltd.

09:25 - 09:40

Strategy of Toppan Photomask

Mr. Michael Hadsell

President,
Toppan Photomasks, Inc.

09:40-10:10

< Morning Keynote >

Beyond the Moore's law
Disruptive and Revolutionary Era of Quantum Computer

Dr. Chingray Chang

Professor of Physics,
National Taiwan University
(Former Interim President , NTU)

10:10 - 10:35

Tea Break (25 min)

-

10:35 - 11:00

Introduction of Development and Design of Sensor ICs

Mr. Yasuyuki Imai

Manager of Device OEM Production Planning,
Toppan Technical Design Center Co., Ltd.

11:00 - 11:30

< Morning Keynote 2 >

Paradigm Shift in DRAM Industry

Dr. Pei-Lin Pai

Vice President, Research and Development,
Winbond Electronics Corporation

11:30 - 13:00

Lunch Break (90 min)

-

13:00 - 13:05

Stream Video

-

13:05 - 13:45

<Afternoon Keynote>

From the 1000x Challenge to 5G and AIoT

Dr. Yang Du

Vice President, Research and Development,
Vanguard International Semiconductor Co.

13:45 - 14:25

Which Type of Photomask Is the Best from the Viewpoint of the Wafer Lithography?

Mr. Yusuke Okawa

Deputy Manager of PM Development,
Toppan Printing Co, Ltd.

14:25-14:45

Next-gen EUV Mask Materials

Dr. Franklin Kalk

Executive Vice President of Technology,
Toppan Photomasks, Inc.

14:45 - 15:15

Tea Break (30 min)

Q&A Session at Lobby
(Toppan Presentations)

15:15 - 15:45

Single Beam/Multi Beam Writer Opportunities and TCE Advanced Mask Technology for 7 nm and Beyond

Mr. Masayuki Kagawa

Supervisor
Photomask Technology Strategy and Integration,
Toppan Printing Co, Ltd

Mr. Anton Chang

Vice President, Photomask Operations,
Toppan Chunghwa Electronics Co., Ltd.

15:45

Wrap Up

-


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